ATLANT 3D Nanosystems

ATLANT 3D Nanosystems
Description: ATLANT 3D Nanosystems is a pioneering deep-tech company specializing in atomic-scale advanced manufacturing. The company has developed a unique micro and nanofabrication platform technology that enables atomically precise advanced manufacturing of materials and electronics. Their proprietary technology allows for rapid innovation across the microelectronics value chain, including advanced materials R&D, prototyping of micro and nanodevices, and scalable manufacturing.
Vision:
To reshape the future of advanced manufacturing by providing innovative solutions that allow for rapid innovation with atomic precision, thereby revolutionizing industries such as microelectronics, optics, photonics, and more.
Mission:
To democratize access to micro and nanotechnology globally, enabling on-demand atomically precise advanced manufacturing on Earth and beyond.
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Investors:
Funding:
  • Grant : May 1, 2020 , €2 million
  • Convertible Note: Sep 1, 2021, €1.51 million
  • Series A Funding: Sep 12, 2022, €14,210 million
Total Funding: €30 million
Key Milestones:
  • 2018: ATLANT 3D Nanosystems was founded by Dr. Maksym Plakhotnyuk, Ivan Kundrata, and Prof. Dr. Julien Bachmann, with support from major European universities, including the Technical University of Denmark, the Institute of Electrical Engineering Slovak Academy of Sciences, and Friedrich Alexander University Erlangen-Nuremberg
  • 2022: The company secured $15 million in Series A funding led by West Hill Capital, with participation from existing investors, including a leading Japanese corporation. The funds are intended to advance the development of their proprietary technology and move closer to their vision of creating a network-centric smart advanced manufacturing infrastructure.
  • 2025: Secured an additional $15M in Series A+ funding to meet growing demand for DALP® technology.
Key People:
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Products & Services:
  • NANOFABRICATOR™ LITE: A compact tool designed to accelerate material testing, process development, and device innovation with atomic precision.Features:Materials: Capable of processing up to 2 materials simultaneously.Line Width: Achieves line widths of 400 µm.Sample Size: Accommodates samples up to 4 inches (100 mm).Deposition Speed: Up to 200 mm/s.Applications: Suitable for MEMS, sensors, optics, photonics, advanced packaging, microelectronics, and emerging applications.
  • NANOFABRICATOR™ PRO: An advanced platform for micro- and nano-scale fabrication, offering enhanced capabilities for industrial R&D.Features:Materials: Handles up to 6 materials simultaneously.Line Width: Ranges from 400 to 50 µm.Sample Size: Supports samples up to 8 inches (200 mm).Deposition Speed: Up to 500 mm/s.Applications: Ideal for sophisticated material innovation and small batch prototyping.
  • Direct Atomic Layer Processing (DALP®) Technology: A proprietary technology that revolutionizes prototyping by enabling rapid, precise operations at the atomic level.Benefits:Accelerated Development Cycles: Reduces prototyping time from months to days.Atomic-Level Control: Facilitates complex prototype development with atomic precision.Versatile Material Adaptability: Compatible with over 450 materials.Cost Efficiency: Minimizes waste and reduces costs through increased efficiency.Applications: Applicable across semiconductor manufacturing, nanomaterial development, and other advanced manufacturing sectors.
  • A-HUB Solutions: On-site R&D and manufacturing capabilities that support rapid prototyping, pilot projects, and feasibility studies. This encompasses facilities like A-HUB, A-LAB, and A-FAB, which provide comprehensive support for advanced material innovation and device development.
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